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NOTICE OF AWARD OF four dry etch and deposition systems, specifically: â¢A Deep-Silicon Reactive Ion Etcher (D-RIE) â¢An Inductively Coupled Plasma-RIE (ICP-RIE) â¢A parallel plate RIE â¢A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)
| Supplier | Identifier | Award Value | Cross-References |
|---|---|---|---|
| Oxford Instruments | 00775598 | £2,155,581 | - |